Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/85691
Title: | Periodic feature patterning by lens based solid immersion multiple beam laser interference lithography | Authors: | Murukeshan, V. M. Sidharthan Raghuraman. |
Issue Date: | 2012 | Source: | Sidharthan, R., & Murukeshan, V.M. (2012). Periodic feature patterning by lens based solid immersion multiple beam laser interference lithography. Laser Physics Letters, 9(9), 691-696. | Series/Report no.: | Laser physics letters | Abstract: | In this paper, we report a novel concept and methodology to fabricate high resolution periodic features using i-line laser source and multiple converging lenses. This configuration reduces the number of optical elements by employing a converging two-lens system to direct the beams on to the sample instead of conventional multiple mirror assembly that is normally associated with multiple beam interference configurations. A simple optical configuration using a 60° prism, 364 nm laser source and two converging lenses are employed to implement immersion lithography concept to achieve four beam interference. Square lattice patterns with pitch size of 210±8 and 240±6 nm are recorded on a positive photo resist using this technique. | URI: | https://hdl.handle.net/10356/85691 http://hdl.handle.net/10220/16599 |
DOI: | 10.7452/lapl.201210056 | Schools: | School of Mechanical and Aerospace Engineering | Fulltext Permission: | none | Fulltext Availability: | No Fulltext |
Appears in Collections: | MAE Journal Articles |
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