Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/101184
Title: | Wafer level silicon mould fabrication and imprinting of high density microstructures | Authors: | Wong, T. I. Ong, H. Y. Lu, H. J. Tse, M. S. Quan, C. G. Ng, S. H. Zhou, X. |
Keywords: | DRNTU::Engineering::Electrical and electronic engineering | Issue Date: | 2013 | Source: | Wong, T. I., Ong, H. Y., Lu, H. J., Tse, M. S., Quan, C. G., Ng, S. H., & Zhou, X. (2013). Wafer level silicon mould fabrication and imprinting of high density microstructures. Microelectronic engineering, 104, 64-68. | Series/Report no.: | Microelectronic engineering | Abstract: | Wafer level mould fabrication and its imprinting technology are of great interest for cost effective mass fabrication of nano or microsized patterns. Although the process for making a silicon mould involves only several steps such as photolithography, deep reactive ion etching (DRIE) and nanoimprinting, there are still many issues to be overcome in order to achieve uniformly imprinted patterns on the whole wafer. Taking a 4″ wafer full of high density 3 × 3 μm squares with a depth of 10 μm as an example, this paper investigates the pitfalls in silicon mould fabrication and imprinting, and provides feasible solutions as a good reference to researchers seeking to mass fabricate micron-sized patterns by thermal imprinting. | URI: | https://hdl.handle.net/10356/101184 http://hdl.handle.net/10220/16751 |
ISSN: | 0167-9317 | DOI: | 10.1016/j.mee.2012.11.011 | Schools: | School of Electrical and Electronic Engineering | Organisations: | A*STAR SIMTech | Fulltext Permission: | none | Fulltext Availability: | No Fulltext |
Appears in Collections: | EEE Journal Articles |
SCOPUSTM
Citations
50
2
Updated on Mar 26, 2024
Web of ScienceTM
Citations
50
2
Updated on Oct 23, 2023
Page view(s) 20
678
Updated on Mar 29, 2024
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.