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Metallization proximity studies for copper spiral inductors on silicon

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Metallization proximity studies for copper spiral inductors on silicon

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dc.contributor.author Sia, Choon Beng
dc.contributor.author Yeo, Kiat Seng
dc.contributor.author Do, Manh Anh
dc.contributor.author Ma, Jianguo
dc.date.accessioned 2009-08-03T06:02:34Z
dc.date.available 2009-08-03T06:02:34Z
dc.date.copyright 2003
dc.date.issued 2009-08-03T06:02:34Z
dc.identifier.citation Sia, C. B., Yeo, K. S., Do, M. A., & Ma, J. G. (2003). Metallization proximity studies for copper spiral inductors on silicon. IEEE Transactions on Semiconductor Manufacturing, 16(2), 220-227.
dc.identifier.issn 0894-6507
dc.identifier.uri http://hdl.handle.net/10220/6016
dc.description.abstract The impacts of metallization proximity for copper spiral inductors on silicon have been investigated in this paper. Performance of the spiral inductor versus area consumption tradeoff with respect to its core diameter is evaluated quantitatively for the first time. Effects of the inductor’s proximate grounded metallization on its overall inductive performance are also analyzed.
dc.format.extent 8 p.
dc.language.iso en
dc.relation.ispartofseries IEEE transactions on semiconductor manufacturing
dc.rights IEEE Transactions on Semiconductor Manufacturing © 2003 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site.
dc.subject DRNTU::Engineering::Electrical and electronic engineering.
dc.title Metallization proximity studies for copper spiral inductors on silicon
dc.type Journal Article
dc.contributor.school School of Electrical and Electronic Engineering
dc.identifier.doi http://dx.doi.org/10.1109/TSM.2003.811574
dc.description.version Published version

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