| dc.contributor.author |
Ong, Vincent K. S. |
| dc.contributor.author |
Tan, Chee Chin. |
| dc.contributor.author |
Radhakrishnan, K. |
| dc.date.accessioned |
2010-08-20T08:21:46Z |
| dc.date.available |
2010-08-20T08:21:46Z |
| dc.date.copyright |
2009 |
| dc.date.issued |
2010-08-20T08:21:46Z |
| dc.identifier.citation |
Ong, V. K. S., Tan, C. C., & Radhakrishnan, K. (2009). Extraction of diffusion length using junction-less EBIC. In proceedings of the 12th International Symposium on Integrated Circuits: Singapore, (pp.526-529). |
| dc.identifier.uri |
http://hdl.handle.net/10220/6339 |
| dc.description.abstract |
The electron-beam-induced current (EBIC) mode
of the scanning electron microscope (SEM) has been widely used
in semiconductor materials and devices characterization in
particular the extraction of minority carrier properties. The
conventional approaches require the sample to have a built-in
electric field created by the charge collecting junction that
separates the majority carriers from the minority carriers and
drives the induced current into the external circuitry for
detection. As a result, these conventional approaches are not
applicable for samples without junctions, i.e. bare substrates.
This paper discusses the feasibility of extracting the minority
carrier diffusion length in junction-less sample using the
junction-less EBIC technique with the use of a two-point probe
method. A 2-D device simulator is used to verify this technique
and it is found the accuracy depends on the location of the origin. |
| dc.format.extent |
4 p. |
| dc.language.iso |
en |
| dc.rights |
© 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. |
| dc.subject |
DRNTU::Engineering::Electrical and electronic engineering::Electronic systems::Signal processing. |
| dc.title |
Extraction of diffusion length using junction-less EBIC. |
| dc.type |
Conference Paper |
| dc.contributor.conference |
IEEE International Symposium on Integrated Circuits (12th:2009:Singapore) |
| dc.contributor.school |
School of Electrical and Electronic Engineering |
| dc.identifier.openurl |
http://ieeexplore.ieee.org/search/freesrchabstract.jsp?tp=&arnumber=5403693&queryText%3DExtraction+of+Diffusion+Length+Using+Junction-less+EBIC%26openedRefinements%3D*%26searchField%3DSearch+All |
| dc.identifier.openurl |
http://www.isic2009.org/ |
| dc.description.version |
Published version |
