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Memory effect of Al-rich AlN films synthesized with rf magnetron sputtering

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Memory effect of Al-rich AlN films synthesized with rf magnetron sputtering

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Title: Memory effect of Al-rich AlN films synthesized with rf magnetron sputtering
Author: Zhao, P.; Liu, Yang; Chen, Tupei; Zhang, Sam; Fu, Yong Qing; Fung, Stevenson Hon Yuen
Copyright year: 2005
Abstract: Al-rich AlN thin film, which is deposited onto n-type Si substrate by radio frequency sputtering of Al target in an argon and Nitrogen gas mixture, can exhibit a large memory effect as a result of charge trapping in the Al nanoparticles/nanoclusters embedded in the AlN matrix. For the metal-insulator-semiconductor structure with a 60 nm Al-rich AlN thin film, a voltage of −15 V applied to the metal electrode for 10^−6 s causes a flatband voltage shift of ∼ 1.5 V. Both electron trapping and hole trapping are possible, depending on the polarity of the applied voltage. In addition, whether the electron trapping or the hole trapping is the dominant process also depends on the charging time and the magnitude of the voltage. The Al-rich AlN thin films provide the possibility of memory applications with low cost.
Subject: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors.
Type: Journal Article
Series/ Journal Title: Applied physics letters
School: School of Electrical and Electronic Engineering
Rights: Applied Physics Letters © copyright 2005 American Institute of Physics. The journal's website is located at http://apl.aip.org/applab/v87/i3/p033112_s1?isAuthorized=no
Version: Published version

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