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Title:
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Fabrication at wafer level of miniaturized gas sensors based on SnO2 nanorods deposited by PECVD and gas sensing characteristics.
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Author:
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Forleo, Angiola.; Francioso, Luca.; Capone, Simonetta.; Casino, Flavio.; Siciliano, Pietro.; Tan, Ooi Kiang.; Huang, Hui.
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Copyright year:
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2010 |
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Abstract:
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SnO2 nanorods were successfully deposited on 3″ Si/SiO2 wafers by inductively coupled plasma-enhanced chemical vapour deposition (PECVD) and a wafer-level patterning of nanorods layer for miniaturized solid state gas sensor fabrication were performed. Uniform needle-shaped SnO2 nanorods in situ grown were obtained under catalyst- and high temperature treatment-free growth condition. These nanorods have an average diameter between 5 and 15 nm and a length of 160–300 nm. The SnO2-nanorods based gas sensors were tested towards NH3 and CH3OH and gas sensing tests show remarkable response, showing promising and repeatable results compared with the SnO2 thin films gas sensors. |
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Subject:
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DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics. |
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Type:
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Journal Article |
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Series/ Journal Title:
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Sensors and actuators B: chemical |
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School:
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School of Electrical and Electronic Engineering |
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Rights:
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© 2010 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Sensors and Actuators B: Chemical, Elsevier. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.snb.2010.01.010. |
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Version:
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Accepted version |
