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Fabrication at wafer level of miniaturized gas sensors based on SnO2 nanorods deposited by PECVD and gas sensing characteristics

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Fabrication at wafer level of miniaturized gas sensors based on SnO2 nanorods deposited by PECVD and gas sensing characteristics

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dc.contributor.author Forleo, Angiola
dc.contributor.author Francioso, Luca
dc.contributor.author Capone, Simonetta
dc.contributor.author Casino, Flavio
dc.contributor.author Siciliano, Pietro
dc.contributor.author Tan, Ooi Kiang
dc.contributor.author Huang, Hui
dc.date.accessioned 2011-09-08T06:18:37Z
dc.date.available 2011-09-08T06:18:37Z
dc.date.copyright 2010
dc.date.issued 2011-09-08
dc.identifier.citation Forleo, A., Francioso, L., Capone, S., Casino, F., Siciliano, P., Tan, O. K., & et al. (2010). Fabrication at wafer level of miniaturized gas sensors based on SnO2 nanorods deposited by PECVD and gas sensing characteristics. Sensors and Actuators B: Chemical, 154, 283-287.
dc.identifier.uri http://hdl.handle.net/10220/7024
dc.description.abstract SnO2 nanorods were successfully deposited on 3″ Si/SiO2 wafers by inductively coupled plasma-enhanced chemical vapour deposition (PECVD) and a wafer-level patterning of nanorods layer for miniaturized solid state gas sensor fabrication were performed. Uniform needle-shaped SnO2 nanorods in situ grown were obtained under catalyst- and high temperature treatment-free growth condition. These nanorods have an average diameter between 5 and 15 nm and a length of 160–300 nm. The SnO2-nanorods based gas sensors were tested towards NH3 and CH3OH and gas sensing tests show remarkable response, showing promising and repeatable results compared with the SnO2 thin films gas sensors.
dc.format.extent 5 p.
dc.language.iso en
dc.relation.ispartofseries Sensors and actuators B: chemical
dc.rights © 2010 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Sensors and Actuators B: Chemical, Elsevier.  It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document.  The published version is available at: http://dx.doi.org/10.1016/j.snb.2010.01.010.
dc.subject DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics.
dc.title Fabrication at wafer level of miniaturized gas sensors based on SnO2 nanorods deposited by PECVD and gas sensing characteristics
dc.type Journal Article
dc.contributor.school School of Electrical and Electronic Engineering
dc.identifier.doi http://dx.doi.org/10.1016/j.snb.2010.01.010
dc.description.version Accepted version
dc.identifier.rims 160002

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