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Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements

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Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements

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dc.contributor.author Karuturi, Siva Krishna
dc.contributor.author Liu, Lijun
dc.contributor.author Su, Liap Tat
dc.contributor.author Zhao, Yang
dc.contributor.author Fan, Hong Jin
dc.contributor.author Ge, Xiaochen
dc.contributor.author He, Sailing
dc.contributor.author Tok, Alfred Iing Yoong
dc.date.accessioned 2011-12-16T05:55:08Z
dc.date.available 2011-12-16T05:55:08Z
dc.date.copyright 2010
dc.date.issued 2011-12-16
dc.identifier.citation Karuturi, S., Liu, L., Su, L. T., Zhao, Y., Fan, H. J., Ge, X., & et al. (2010). Kinetics of Stop Flow Atomic Layer Deposition for High Aspect Ratio Template Filling through Photonic Bandgap Measurements, Journal of Physical Chemistry C, 114(35), 14843-14848.
dc.identifier.uri http://hdl.handle.net/10220/7416
dc.description.abstract Atomic layer deposition (ALD) is shown as a unique method to produce high aspect ratio (AR) nanostructures through conformal filling and replication of high AR templates. The stop-flow process is often used as an alternative to the conventional continuous flow process to obtain high step coverage. However, there is a need for understanding the deposition kinetics and optimizing the deposition process to fabricate defect-free nanostructures. In this Article, TiO2 ALD in high AR self-assembled opal photonic crystal templates was performed in stop-flow fill−hold−purge process in comparison with continuous flow pulse−purge process. Photonic band gap properties of opal templates were characterized and compared with simulated band diagrams for quantitative investigation of filling kinetics and the effect of shrinking pore size on filling uniformity. Γ−L bands in the transmittance spectra of ALD-infiltrated opals accurately represented the depth profile of the depositions without the need for expensive sample preparation techniques and characterization tools. It was found that the stop-flow process attains higher Knudsen flow rates of precursor gases, thereby achieving homogeneous and complete filling at considerably lower cycle time.
dc.language.iso en
dc.relation.ispartofseries Journal of physical chemistry C
dc.rights © 2010 American Chemical Society
dc.subject DRNTU::Engineering::Materials::Photonics and optoelectronics materials.
dc.title Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1021/jp1053748

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