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Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

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Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films

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dc.contributor.author Sun, T.
dc.contributor.author Ma, Jan
dc.contributor.author Yan, Qingyu
dc.contributor.author Huang, Y. Z.
dc.contributor.author Wang, J. L.
dc.contributor.author Hng, Huey Hoon
dc.date.accessioned 2012-02-09T06:11:45Z
dc.date.available 2012-02-09T06:11:45Z
dc.date.copyright 2009
dc.date.issued 2012-02-09
dc.identifier.citation Sun, T., Ma, J., Yan, Q., Huang, Y. Z., Wang, J. L. & Hng, H. H. (2009). Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films. Journal of Crystal Growth, 311(16), 4123–4128.
dc.identifier.uri http://hdl.handle.net/10220/7518
dc.description.abstract The effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca3Co4O9 thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the CaxCoO2 secondary phase. Formation of CaxCoO2 was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the CaxCoO2 phase was able to transit into the desired Ca3Co4O9 phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca3Co4O9 thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film.
dc.language.iso en
dc.relation.ispartofseries Journal of crystal growth
dc.rights © 2009 Elsevier B.V. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Crystal Growth, Elsevier B.V.. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.jcrysgro.2009.06.044 .
dc.subject DRNTU::Engineering::Materials.
dc.title Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1016/j.jcrysgro.2009.06.044
dc.description.version Accepted version

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