Nickel silicide formation using multiple-pulsed laser annealing

DSpace/Manakin Repository


Search DR-NTU

Advanced Search Subject Search


My Account

Nickel silicide formation using multiple-pulsed laser annealing

Show simple item record

dc.contributor.author Setiawan, Y.
dc.contributor.author Lee, Pooi See
dc.contributor.author Pey, Kin Leong
dc.contributor.author Wang, X. C.
dc.contributor.author Lim, G. C.
dc.contributor.author Chow, F. L.
dc.date.accessioned 2012-05-16T06:07:04Z
dc.date.available 2012-05-16T06:07:04Z
dc.date.copyright 2007
dc.date.issued 2012-05-16
dc.identifier.citation Setiawan, Y., Lee, P. S., Pey, K. L., Wang, X. C., Lim, G. C., & Chow, F. L. (2007). Nickel silicide formation using multiple-pulsed laser annealing. Journal of Applied Physics, 101(3).
dc.identifier.uri http://hdl.handle.net/10220/8009
dc.description.abstract The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J cm−2. Different solidification velocities caused by a variation in the atomic concentration across the melt have led to the formation of this layered structure. On the other hand, by increasing the number of laser pulses, a continuous layer of polycrystalline NiSi was obtained after a 20-pulsed laser annealing at 0.3 J cm−2 laser fluence. Its formation is attributed to a better elemental mixing which occurred during subsequent pulses. Enhancement of surface absorption and remelting of the phases formed is proposed as the mechanism governing the continuous NiSi layer formation.
dc.format.extent 5 p.
dc.language.iso en
dc.relation.ispartofseries Journal of applied physics
dc.rights © 2007 American Institute of Physics. This paper was published in Journal of Applied Physics and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.2433707. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
dc.subject DRNTU::Engineering::Materials.
dc.title Nickel silicide formation using multiple-pulsed laser annealing
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1063/1.2433707
dc.description.version Published version

Files in this item

Files Size Format View
69. Nickel sili ... pulsed laser annealing.pdf 318.1Kb PDF View/Open

This item appears in the following Collection(s)

Show simple item record


Total views

All Items Views
Nickel silicide formation using multiple-pulsed laser annealing 283

Total downloads

All Bitstreams Views
69. Nickel silicide formation using multiple-pulsed laser annealing.pdf 221

Top country downloads

Country Code Views
United States of America 77
China 45
Germany 17
Singapore 9
Unknown Country 8

Top city downloads

city Views
Mountain View 56
Beijing 22
Singapore 8
Frankfurt Am Main 7
Shenzhen 4

Downloads / month

  2015-03 2015-04 2015-05 total
69. Nickel silicide formation using multiple-pulsed laser annealing.pdf 0 0 6 6