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Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor

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Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor

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dc.contributor.author Ong, K. K.
dc.contributor.author Pey, Kin Leong
dc.contributor.author Lee, Pooi See
dc.contributor.author Wee, A. T. S.
dc.contributor.author Wang, X. C.
dc.contributor.author Tung, Chih Hang
dc.contributor.author Tang, L. J.
dc.contributor.author Chong, Y. F.
dc.date.accessioned 2012-05-17T03:01:41Z
dc.date.available 2012-05-17T03:01:41Z
dc.date.copyright 2006
dc.date.issued 2012-05-17
dc.identifier.citation Ong, K. K., Pey, K. L., Lee, P. S., Wee, A. T. S., Wang, X. C., Tung, C. H., et al. (2006). Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor. Applied Physics Letters, 89(12).
dc.identifier.uri http://hdl.handle.net/10220/8062
dc.description.abstract In this letter, the authors study the importance of a low temperature anneal in the removal of crystalline defects resulting from pulsed laser annealing of preamorphized ultrashallow p+ln junction. Using an additional low thermal budget rapid thermal annealing at 600 °C for 60 s, suppression of junction leakage current of two orders in a single-pulse laser annealing and one order in a ten-pulse laser annealing is achieved through a reduction of the residual crystalline defects that could not be annihilated by laser annealing. p-channel metal-oxide-semiconductor field effect transistors with good electrical characteristics can be obtained using pulsed laser annealing followed by a low thermal budget rapid thermal annealing.
dc.format.extent 3 p.
dc.language.iso en
dc.relation.ispartofseries Applied physics letters
dc.rights © 2006 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official URL: http://dx.doi.org/10.1063/1.2354446. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
dc.subject DRNTU::Engineering::Materials.
dc.title Role of low temperature rapid thermal annealing in post-laser-annealed p-channel metal-oxide-semiconductor field effect transistor
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1063/1.2354446
dc.description.version Published version

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