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Magnetron sputtered TiO2 films on a stainless steel substrate : selective rutile phase formation and its tribological and anti-corrosion performance

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Magnetron sputtered TiO2 films on a stainless steel substrate : selective rutile phase formation and its tribological and anti-corrosion performance

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Title: Magnetron sputtered TiO2 films on a stainless steel substrate : selective rutile phase formation and its tribological and anti-corrosion performance
Author: Krishna, Dangeti Siva Rama; Sun, Yong; Chen, Zhong
Copyright year: 2011
Abstract: In this work, TiO2 films on 316L stainless steel have been formed by non-reactive magnetron sputtering of TiO2 target. The effect of a titanium underlayer on the crystalline phase of the TiO2 film has been investigated in terms of phase evolution, film morphology, corrosion resistance, adhesion strength, hardness and tribological characteristics. Results showed that the titanium underlayer has a significant effect on the phase of the TiO2 film. Without this underlayer, an anatase TiO2 film is produced, in consistence with many other investigations. However, it is found that with a titanium underlayer, a rutile TiO2 film can be directly formed on the substrate. The thickness of the interface layer affects the crystallinity of the rutile film. By controlling the underlayer thickness, the resultant rutile film crystal structure and morphology could be changed accordingly. At an optimized state, the rutile coating shows much improved adhesion, friction, wear and corrosion properties.
Subject: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Type: Journal Article
Series/ Journal Title: Thin solid films
School: School of Materials Science and Engineering
Rights: © 2011 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Thin Solid Films, Elsevier. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: [http://dx.doi.org/10.1016/j.tsf.2011.01.042].
Version: Accepted version

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