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Zinc oxide quantum dots embedded films by metal organic chemical vapor deposition

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Zinc oxide quantum dots embedded films by metal organic chemical vapor deposition

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dc.contributor.author Tan, Swee Tiam
dc.contributor.author Sun, Xiaowei
dc.contributor.author Zhang, X. H.
dc.contributor.author Chen, B. J.
dc.contributor.author Chua, S. J.
dc.contributor.author Yong, Anna
dc.contributor.author Dong, Zhili
dc.contributor.author Hu, Xiao
dc.date.accessioned 2012-07-03T07:04:01Z
dc.date.available 2012-07-03T07:04:01Z
dc.date.copyright 2006
dc.date.issued 2012-07-03
dc.identifier.citation Tan, S. T., Sun, X., Zhang, X. H., Chen, B. J., Chua, S. J., Yong, A., et al. (2006). Zinc oxide quantum dots embedded films by metal organic chemical vapor deposition. Journal of Crystal Growth, 290(2), 518-522.
dc.identifier.uri http://hdl.handle.net/10220/8276
dc.description.abstract Zinc oxide (ZnO) quantum dots (QDs) were fabricated on silicon substrates by metal organic chemical vapor deposition. Formation of QDs is due to the vigorous reaction of the precursors when a large amount of precursors was introduced during the growth. The size of the QDs ranged from 3 to 12 nm, which was estimated by high-resolution transmission electron microscopy. The photoluminescence measured at 80K showed that the emission of QDs embedded film ranged from 3.0 to 3.6eV. The broad near-band-edge emission was due to the quantum confinement effect of the QDs.
dc.format.extent 12 p.
dc.language.iso en
dc.relation.ispartofseries Journal of crystal growth
dc.rights © 2006 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Crystal Growth, Elsevier. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.jcrysgro.2006.02.035.
dc.subject DRNTU::Engineering::Materials.
dc.title Zinc oxide quantum dots embedded films by metal organic chemical vapor deposition
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1016/j.jcrysgro.2006.02.035
dc.description.version Accepted version

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