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Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography

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Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography

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Title: Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography
Author: Zhang, Hua; Chung, Sung-Wook; Mirkin, Chad A.
Copyright year: 2003
Abstract: The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold.
Subject: DRNTU::Engineering::Materials.
Type: Journal Article
Series/ Journal Title: Nano letters
School: School of Materials Science and Engineering
Rights: © 2003 American Chemical Society.

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