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Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol.

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Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol.

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dc.contributor.author Lu, Gang.
dc.contributor.author Chen, Yanhong.
dc.contributor.author Li, Bing.
dc.contributor.author Zhou, Xiaozhu.
dc.contributor.author Xue, Can.
dc.contributor.author Ma, Jan.
dc.contributor.author Boey, Yin Chiang Freddy.
dc.contributor.author Zhang, Hua.
dc.date.accessioned 2012-09-21T05:57:41Z
dc.date.available 2012-09-21T05:57:41Z
dc.date.copyright 2009
dc.date.issued 2012-09-21
dc.identifier.citation Lu, G., Chen, Y., Li, B., Zhou, X., Xue, C., Ma, J., et al. (2009). Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol. The Journal of Physical Chemistry C, 113(10), 4184-4187.
dc.identifier.issn 1932-7447
dc.identifier.uri http://hdl.handle.net/10220/8602
dc.description.abstract The etch resist ability of dip-pen nanolithography (DPN)-generated dot patterns of different alkanethiols on Au was systematically studied. After 16-mercaptohexadecanioc acid (MHA) and 1-octadecanethiol (ODT) dots with different diameters were patterned on a Au substrate by DPN, the substrate was etched in a feri-/ferrocyanide solution. Tapping mode AFM (TMAFM) was used to monitor the morphology change of the patterned dots during the wet chemical etching. The diameter and height of MHA and ODT dots at different etch time were measured by TMAFM. The resist ability of the patterned MHA and ODT SAMs on Au was compared. The result shows that the MHA patterns have better etch resist ability than do ODT patterns.
dc.language.iso en
dc.relation.ispartofseries The journal of physical chemistry C
dc.rights © 2009 American Chemical Society.
dc.subject DRNTU::Engineering::Materials.
dc.title Dip-pen nanolithography-generated patterns used as gold etch resists : a comparison study of 16-mercaptohexadecanioc acid and 1-octadecanethiol.
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1021/jp810746j

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