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Nanolithography of single-layer graphene oxide films by atomic force microscopy

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Nanolithography of single-layer graphene oxide films by atomic force microscopy

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Title: Nanolithography of single-layer graphene oxide films by atomic force microscopy
Author: Lu, Gang; Zhou, Xiaozhu; Li, Hai; Yin, Zongyou; Li, Bing; Huang, Ling; Boey, Freddy Yin Chiang; Zhang, Hua
Copyright year: 2010
Abstract: Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications.
Subject: DRNTU::Engineering::Materials.
Type: Journal Article
Series/ Journal Title: Langmuir
School: School of Materials Science and Engineering
Rights: © 2010 American Chemical Society.

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