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Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides

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Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides

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dc.contributor.author Zhang, Hua
dc.contributor.author Li, Zhi
dc.contributor.author Mirkin, Chad A.
dc.date.accessioned 2012-09-24T01:20:00Z
dc.date.available 2012-09-24T01:20:00Z
dc.date.copyright 2002
dc.date.issued 2012-09-24
dc.identifier.citation Zhang, H., Li, Z., & Mirkin, C. A. (2002). Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides. Advanced Materials, 14(20), 1472-1474.
dc.identifier.issn 1521-4095
dc.identifier.uri http://hdl.handle.net/10220/8606
dc.description.abstract Arrays of Au nanostructures have been fabricated based on dip-pen nanolithography and wet chemical etching, whereafter they can be functionalized with alkanethiol-capped oligonucleotides. These retain their hybridization properties on the surfaces of the nanopatterns and can react with complementary DNA or particles modified with complementary DNA.
dc.language.iso en
dc.relation.ispartofseries Advanced materials
dc.rights © 2002 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
dc.subject DRNTU::Engineering::Materials.
dc.title Dip-pen nanolithography-based methodology for preparing arrays of nanostructures functionalized with oligonucleotides
dc.type Journal Article
dc.contributor.school School of Materials Science and Engineering
dc.identifier.doi http://dx.doi.org/10.1002/1521-4095(20021016)14:20<1472::AID-ADMA1472>3.0.CO;2-E

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