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High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures.

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High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures.

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Title: High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures.
Author: Zhang, Hua.; Amro, Nabil A.; Disawal, Sandeep.; Elghanian, Robert.; Shile, Roger.; Fragala, Joseph.
Copyright year: 2007
Abstract: Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the fabrication of large-area Si nanostructure arrays (see AFM image; dot 1: diameter/height=1460/140 nm; dot 9: diameter/height=385/75 nm).
Subject: DRNTU::Engineering::Materials.
Type: Journal Article
Series/ Journal Title: Small
School: School of Materials Science and Engineering
Rights: © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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