Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/90287
Title: | Fine electron biprism on a Si-on-insulator chip for off-axis electron holography | Authors: | Duchamp, Martial Girard, Olivier Pozzi, Giulio Soltner, Helmut Winkler, Florian Speen, Rolf Dunin-Borkowski, Rafal E. Cooper, David |
Keywords: | Electron Biprism DRNTU::Engineering::Materials |
Issue Date: | 2017 | Source: | Duchamp, M., Girard, O., Pozzi, G., Soltner, H., Winkler, F., Speen, R., . . . Cooper, D. (2017). Fine electron biprism on a Si-on-insulator chip for off-axis electron holography. Ultramicroscopy, 185, 81-89. doi:10.1016/j.ultramic.2017.11.012 | Series/Report no.: | Ultramicroscopy | Abstract: | Off-axis electron holography allows both the amplitude and the phase shift of an electron wavefield propagating through a specimen in a transmission electron microscope to be recovered. The technique requires the use of an electron biprism to deflect an object wave and a reference wave to form an interference pattern. Here, we introduce an approach based on semiconductor processing technology to fabricate fine electron biprisms with rectangular cross-sections. By performing electrostatic calculations and preliminary experiments, we demonstrate that such biprisms promise improved performance for electron holography experiments. | URI: | https://hdl.handle.net/10356/90287 http://hdl.handle.net/10220/48487 |
ISSN: | 0304-3991 | DOI: | 10.1016/j.ultramic.2017.11.012 | Schools: | School of Materials Science & Engineering | Rights: | © 2017 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY-NC-ND license. (http://creativecommons.org/licenses/by-nc-nd/4.0/) | Fulltext Permission: | open | Fulltext Availability: | With Fulltext |
Appears in Collections: | MSE Journal Articles |
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Fine electron biprism on a Si-on-insulator chip for off-axis electron holography.pdf | 2.69 MB | Adobe PDF | View/Open |
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