Academic Profile : Faculty
Assoc Prof Fan Weijun
Associate Professor, School of Electrical & Electronic Engineering
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W. J. Fan received the B. Eng degree in applied physics from National University of Defense Technology, Changsha, China, in 1987, the M. S. degree from the Institute of Semiconductors, Chinese Academy of Science, Beijing, China, in 1990, and the Ph. D. degree in electrical engineering from National University of Singapore, in 1997. From 1990 to 1994, he joined the Institute of Semiconductors, Chinese Academy of Science as a Research Assistant. From 1996 to 1999, he joined MBE Technology Pte. Ltd., Singapore as a System Engineer. From 1999 to 2000, he was a Process Engineer at Agilent Technologies, Singapore. From 2000 to 2005, he was an Assistant Professor in Nanyang Technological University. From 2005 to now, he is an Associate Professor in Nanyang Technological University.
His research interests include semiconductor band structure calculations; semiconductor material growth, characterizations and photonic device fabrications; Si photonics; Spintronics. He authored/co-authored > 180 refereed journal papers and >100 conference presentations including 10 plenary/invited talks . According to SCI (Web of Science), the total external citations > 3400 times, his h index is 25. He co-authored two book chapters. The granted research funding > S$6 M from NRF, MOE, ASTAR, DARPA(USA) and NSG(Japan) as PI/Co-PI. He graduated > 10 PhD students as Main/Co-supervisor.
He was the scientific committee member, reviewer and optoelectronics session co-chair of Symposium J of ICMAT 2005. He was the Technical Programme Committee Member of Integrated Optoelectronic Devices and Optical Processors of the 43rd European Conference on Optical Communication (ECOC) 2017, Sweden. He served as Chair of Symposium B of the 9th International Conference on Materials for Advanced Technologies, Singapore 2017, and Co-Chair of CLEO-PR, OECC and PGC 2017: Symposium J1 Semiconductor and Integrated Optical Devices. He served as Guest Editor of IEEE JOURNAL OF QUANTUM ELECTRONICS in 2019.
His research interests include semiconductor band structure calculations; semiconductor material growth, characterizations and photonic device fabrications; Si photonics; Spintronics. He authored/co-authored > 180 refereed journal papers and >100 conference presentations including 10 plenary/invited talks . According to SCI (Web of Science), the total external citations > 3400 times, his h index is 25. He co-authored two book chapters. The granted research funding > S$6 M from NRF, MOE, ASTAR, DARPA(USA) and NSG(Japan) as PI/Co-PI. He graduated > 10 PhD students as Main/Co-supervisor.
He was the scientific committee member, reviewer and optoelectronics session co-chair of Symposium J of ICMAT 2005. He was the Technical Programme Committee Member of Integrated Optoelectronic Devices and Optical Processors of the 43rd European Conference on Optical Communication (ECOC) 2017, Sweden. He served as Chair of Symposium B of the 9th International Conference on Materials for Advanced Technologies, Singapore 2017, and Co-Chair of CLEO-PR, OECC and PGC 2017: Symposium J1 Semiconductor and Integrated Optical Devices. He served as Guest Editor of IEEE JOURNAL OF QUANTUM ELECTRONICS in 2019.
His research interests include semiconductor band structure calculations by using effective mass theory, the first-principles method and empirical pseudopotential method (EPM); Compound semiconductor material growth, characterizations and device fabrications; Si photonics; Spintronics.
- Beyond-lead lamellar perovskite-based nano-scintillators
- CMOS-Compatible Resonant-Cavity-Enhanced GeSn Single-Photon Avalanche Photodiode – Material, Design and Device
US 2024/0088628 A1: Optical Device And Method Of Forming The Same (2024)
Abstract: According to embodiments of the present invention, an optical device is provided. The optical device includes a substrate, a semiconductor layer on the substrate, the semiconductor layer having a beam structure that is subjected to a tensile strain, wherein the beam structure includes a plurality of nanostructures, and wherein, for each nanostructure of the plurality of nanostructures, the nanostructure is configured to locally amplify the tensile strain at the nanostructure to define a strain-induced artificial quantum heterostructure for quantum confinement. According to a further embodiment of the present invention, a method of forming an optical device is also provided.
Abstract: According to embodiments of the present invention, an optical device is provided. The optical device includes a substrate, a semiconductor layer on the substrate, the semiconductor layer having a beam structure that is subjected to a tensile strain, wherein the beam structure includes a plurality of nanostructures, and wherein, for each nanostructure of the plurality of nanostructures, the nanostructure is configured to locally amplify the tensile strain at the nanostructure to define a strain-induced artificial quantum heterostructure for quantum confinement. According to a further embodiment of the present invention, a method of forming an optical device is also provided.