dc.contributor.authorKrzhizhanovskaya, Valeria V.
dc.contributor.authorSloot, Peter M. A.
dc.contributor.authorGorbachev, Yu. E.
dc.date.accessioned2013-06-11T01:59:59Z
dc.date.available2013-06-11T01:59:59Z
dc.date.copyright2005en_US
dc.date.issued2005
dc.identifier.citationKrzhizhanovskaya, V. V. , Sloot, P. M. A., & Gorbachev, Y. E. (2005). Grid-Based Simulation of Industrial Thin-Film Production. SIMULATION, 81(1), 77-85.en_US
dc.identifier.urihttp://hdl.handle.net/10220/10144
dc.description.abstractIn this article, the authors introduce a Grid-based virtual reactor, a High Level Architecture (HLA)- supported problem-solving environment that allows for detailed numerical study of industrial thin-film production in plasma-enhanced chemical vapor deposition (PECVD) reactors. They briefly describe the physics and chemistry underpinning the deposition process, the numerical approach to simulate these processes on advanced computer architectures, and the associated software environment supporting computational experiments. The authors built an efficient problem-solving environment for scientists studying PECVD processes and end users working in the chemical industry and validated the resulting virtual reactor against real experiments.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesSIMULATIONen_US
dc.rights© 2005 The Society for Modeling and Simulation International.en_US
dc.titleGrid-based simulation of industrial thin-film productionen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Computer Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1177/0037549705051972


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