Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/96364
Title: Fabrication of unipolar graphene field-effect transistors by modifying source and drain electrode interfaces with zinc porphyrin
Authors: Khaderbad, Mrunal A.
Tjoa, Verawati
Rao, Manohar
Phandripande, Rohit
Madhu, Sheri
Wei, Jun
Ravikanth, Mangalampalli
Mathews, Nripan
Mhaisalkar, Subodh Gautam
Rao, V. Ramgopal
Issue Date: 2012
Source: Khaderbad, M. A., Tjoa, V., Rao, M., Phandripande, R., Madhu, S., Wei, J., et al. (2012). Fabrication of Unipolar Graphene Field-Effect Transistors by Modifying Source and Drain Electrode Interfaces with Zinc Porphyrin. ACS Applied Materials & Interfaces, 4(3), 1434-1439.
Series/Report no.: ACS applied materials & interfaces
Abstract: We report a unipolar operation in reduced graphene oxide (RGO) field-effect transistors (FETs) via modification of the source/drain (S/D) electrode interfaces with self-assembled monolayers (SAMs) of 5-(4-hydroxyphenyl)-10,15,20-tri-(p-tolyl) zinc(II) porphyrin (Zn(II)TTPOH) molecules. The dipolar Zn(II)TTPOH molecules at the RGO/platinum (Pt) S/D interface results in an increase of the electron injection barrier and a reduction of the hole-injection barrier. Using dipole measurements from Kelvin probe force microscopy and highest occupied molecular orbital–lowest unoccupied molecular orbital (HOMO–LUMO) calculations from cyclic voltammetry, the electron and hole injection barriers were calculated to be 2.2 and 0.11 eV, respectively, indicating a higher barrier for electrons, compared to that of holes. A reduced gate modulation in the electron accumulation regime in RGO devices with SAM shows that unipolar RGO FETs can be attained using a low-cost, solution-processable fabrication technique.
URI: https://hdl.handle.net/10356/96364
http://hdl.handle.net/10220/10279
ISSN: 1944-8244
DOI: http://dx.doi.org/10.1021/am201691s
Rights: © 2012 American Chemical Society.
metadata.item.grantfulltext: none
metadata.item.fulltext: No Fulltext
Appears in Collections:MSE Journal Articles

Google ScholarTM

Check

Altmetric

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.