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|Title:||Effect of N incorporation on the characteristics of InSbN P–N diodes||Authors:||Pham, H. T.
Lim, Kim Peow
Yoon, Soon Fatt
Tan, Kian Hua
|Keywords:||DRNTU::Engineering::Electrical and electronic engineering||Issue Date:||2011||Source:||Lim, K. P., Pham, H. T., Yoon, S. F., & Tan, K. H. (2012). Effect of N incorporation on the characteristics of InSbN P–N diodes. Thin Solid Films, 520(6), 2269-2271.||Series/Report no.:||Thin solid films||Abstract:||We report on the effect of N incorporation in the characteristics of the 2 μm thick InSbN photoabsorption layer of a p–n diode grown by molecular beam epitaxy using a radio-frequency plasma-assisted nitrogen source. As compared to N free InSb layer, the absorption wavelength extends to near 9 μm. On the other hand, high reverse dark current and series resistances are observed in the electrical characteristics of the InSbN diode which are contributed with the presence of planar growth defects. These results will be useful to those working on midinfrared photodetectors.||URI:||https://hdl.handle.net/10356/96475
|ISSN:||0040-6090||DOI:||http://dx.doi.org/10.1016/j.tsf.2011.09.047||Rights:||© 2011 Elsevier B.V.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||EEE Journal Articles|
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