Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/97473
Title: Erbium silicidation on SiGe for advanced MOS application
Authors: Yiew, Daphne Q. F.
Setiawan, Y.
Lee, Pooi See
Chi, Dong Zhi
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2005
Source: Yiew, D. Q. F., Setiawan, Y., Lee, P. S., & Chi, D. Z. (2006). Erbium silicidation on SiGe for advanced MOS application. Thin Solid Films, 504(1-2), 91-94.
Series/Report no.: Thin solid films
Abstract: Ti capping has been found to be beneficial on Er(Si1−yGey)2 formation in Ti/Er/Si1−xGex system. In the case of the system without Ti cap, the sample was oxidized at temperature as low as 300 °C and Er2SiO5 was found to be the predominant phase at all annealing temperatures. On the other hand, for Ti/Er/Si1−xGex samples, no Er2O3 was formed and the predominant phase found after annealing at higher temperature was Er(Si1−yGey)2 resulting in a lower sheet resistance than those without Ti cap. In addition, Ti capping has also improved the surface morphology of the sample by reducing the pyramid-like defects which were found in Er/Si1−xGex samples especially after annealing at 600 °C.
URI: https://hdl.handle.net/10356/97473
http://hdl.handle.net/10220/10501
ISSN: 0040-6090
DOI: http://dx.doi.org/10.1016/j.tsf.2005.09.048
Rights: © 2005 Elsevier B.V.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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