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|Title:||Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes||Authors:||Yan, Qingyu
|Keywords:||DRNTU::Engineering::Materials::Metallic materials||Issue Date:||2011||Source:||Wu, S., Yin, Z., He, Q., Lu, G., Yan, Q., & Zhang, H. (2011). Nucleation Mechanism of Electrochemical Deposition of Cu on Reduced Graphene Oxide Electrodes. The Journal of Physical Chemistry C, 115(32), 15973-15979.||Series/Report no.:||The journal of physical chemistry C||Abstract:||The nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide (rGO) electrodes has been systematically studied on the basis of the cyclic voltammetry, Tafel plot, and chronoamperometry. Our results show that the experimental parameters including electrolyte concentration, deposition potential, solution pH, and the presence of background electrolyte can determine the nucleation mechanism. Scanning electron microscopy is employed to study the nucleation and growth of Cu on rGO electrodes. This study is significant in development of the electrochemical method in practical applications based on the rGO electrodes.||URI:||https://hdl.handle.net/10356/97142
|ISSN:||1932-7447||DOI:||http://dx.doi.org/10.1021/jp201667p||Rights:||© 2011 American Chemical Society.||Fulltext Permission:||none||Fulltext Availability:||No Fulltext|
|Appears in Collections:||MSE Journal Articles|
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