Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/95971
Title: Effects of rapid thermal annealing on structural, magnetic and optical properties of Ni-doped ZnO thin films
Authors: Zhao, Xing
Liu, Erjia
Ramanujan, Raju Vijayaraghavan
Chen, Jingsheng
Keywords: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Issue Date: 2011
Source: Zhao, X., Liu, E., Ramanujan, R. V., & Chen, J. (2012). Effects of rapid thermal annealing on structural, magnetic and optical properties of Ni-doped ZnO thin films. Current Applied Physics, 12(3), 834-840.
Series/Report no.: Current applied physics
Abstract: XPS depth profiles were used to investigate the effects of rapid thermal annealing under varying conditions on the structural, magnetic and optical properties of Ni-doped ZnO thin films. Oxidization of metallic Ni from its metallic state to two-valence oxidation state occurred in the film annealed in air at 600 °C, while reduction of Ni2+ from its two-valence oxidation state to metallic state occurred in the film annealed in Ar at 600 and 800 °C. In addition, there appeared to be significant diffusion of Ni from the bottom to the top surface of the film during annealing in Ar at 800 °C. Both as-deposited and annealed thin films displayed obvious room temperature ferromagnetism (RTFM) which was from metallic Ni, Ni2+ or both with two distinct mechanisms. Furthermore, a significant improvement in saturation magnetization (Ms) in the films was observed after annealing in air (Ms = 0.036 μB/Ni) or Ar (Ms = 0.033 μB/Ni) at 600 °C compared to that in as-deposited film (Ms = 0.017 μB/Ni). An even higher Ms value was observed in the film annealed in Ar at 800 °C (Ms = 0.055 μB/Ni) compared to that at 600 °C mainly due to the diffusion of Ni. The ultraviolet emission of the Ni-doped ZnO thin film was restored during annealing in Ar at 800 °C, which was also attributed to the diffusion of Ni.
URI: https://hdl.handle.net/10356/95971
http://hdl.handle.net/10220/10831
ISSN: 1567-1739
DOI: http://dx.doi.org/10.1016/j.cap.2011.11.016
Rights: © 2011 Elsevier B.V.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MAE Journal Articles

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