Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/99245
Title: Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD
Authors: Zhu, Yuhe
Wang, Wei
Jia, Xingya
Akasaka, Tsukasa
Liao, Susan
Watari, Fumio
Issue Date: 2012
Source: Zhu, Y., Wang, W., Jia, X., Akasaka, T., Liao, S., & Watari, F. (2012). Deposition of TiC film on titanium for abrasion resistant implant material by ion-enhanced triode plasma CVD. Applied Surface Science, 262, 156-158.
Series/Report no.: Applied surface science
Abstract: Deposition of titanium carbide (TiC) layer on titanium (Ti) surface has been demonstrated by an ion-enhanced triode plasma chemical vapor deposition (CVD) method using a TiCl4 + CH4 + H2 gas mixture. Physical and mechanical properties of the deposited TiC film on Ti were investigated to examine its potential application as an abrasion resistant implant material. X-ray diffraction (XRD) showed that the specimen was consisted of TiC and Ti. Carbide layer of about 6 μm thickness was observed on the cross section of the specimen by scanning electron microscopy (SEM). The Vickers hardness of surface carbide was more than 2000, which confirmed its high abrasion resistance.
URI: https://hdl.handle.net/10356/99245
http://hdl.handle.net/10220/11022
ISSN: 0169-4332
DOI: http://dx.doi.org/10.1016/j.apsusc.2012.03.152
Rights: © 2012 Elsevier B.V.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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