dc.contributor.authorXu, Naiyun
dc.contributor.authorTeo, Edwin Hang Tong
dc.contributor.authorShakerzadeh, Maziar
dc.contributor.authorWang, Xincai
dc.contributor.authorNg, Chee Mang
dc.contributor.authorTay, Beng Kang
dc.identifier.citationXu, N., Teo, E. H. T., Shakerzadeh, M., Wang, X., Ng, C. M., & Tay, B. K. (2012). Electrical properties of textured carbon film formed by pulsed laser annealing. Diamond and Related Materials, (23), 135-139.en_US
dc.description.abstractPrevious works have showed that textured carbon film can be fabricated by applying suitable ion energy and substrate temperature. In this experiment, the effect of laser annealing on amorphous carbon films was studied. Atomic force microscopy shows the effect of laser irradiation on surface morphology of carbon film, and visible Raman spectroscopy shows that the G peak position shifted from 1540 cm− 1 to 1600 cm− 1, and the increase in I(D)/I(G) intensity ratio indicates the formation of more graphitic film at higher laser energy. High resolution transmission electron microscopy (HRTEM) shows the vertical alignment formation at suitable laser energy. Electrical measurement shows that the vertical aligned carbon films exhibit low resistance, ohmic current–voltage characteristics, which suggests that vertical aligned films formed by laser irradiation may be promising material for future nano-device interconnects.en_US
dc.relation.ispartofseriesDiamond and related materialsen_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering
dc.titleElectrical properties of textured carbon film formed by pulsed laser annealingen_US
dc.typeJournal Article
dc.contributor.researchTemasek Laboratoriesen_US
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US

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