Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/85515
Title: | Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference | Authors: | Murukeshan, V. M. Sathiyamoorthy, K. Sidharthan Raghuraman. |
Keywords: | DRNTU::Engineering::Mechanical engineering | Issue Date: | 2012 | Source: | Sidharthan, R., Murukeshan, V. M., & Sathiyamoorthy, K. (2012). Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference. Journal of nanoscience and nanotechnology, 12(8), 6428-6431. | Series/Report no.: | Journal of nanoscience and nanotechnology | Abstract: | In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939. | URI: | https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729 |
DOI: | 10.1166/jnn.2012.6453 | Schools: | School of Mechanical and Aerospace Engineering | Fulltext Permission: | none | Fulltext Availability: | No Fulltext |
Appears in Collections: | MAE Journal Articles |
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