dc.contributor.authorSidharthan Raghuraman.
dc.contributor.authorMurukeshan, V. M.
dc.contributor.authorSathiyamoorthy, K.
dc.date.accessioned2013-09-30T05:59:20Z
dc.date.available2013-09-30T05:59:20Z
dc.date.copyright2012en_US
dc.date.issued2012
dc.identifier.citationSidharthan, R., Murukeshan, V. M., & Sathiyamoorthy, K. (2012). Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference. Journal of nanoscience and nanotechnology, 12(8), 6428-6431.
dc.identifier.urihttp://hdl.handle.net/10220/13729
dc.description.abstractIn this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesJournal of nanoscience and nanotechnologyen_US
dc.subjectDRNTU::Engineering::Mechanical engineering
dc.titleSub-60 nm periodic grating feature patterning by immersion based 364 nm laser interferenceen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1166/jnn.2012.6453


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