Effects of rapid thermal annealing on structure and luminescence of self-assembled InAs/GaAs quantum dots
Author
Xu, S. J.
Wang, X. C.
Chua, S. J.
Wang, C. H.
Fan, Weijun
Jiang, J.
Xie, X. G.
Date of Issue
1998School
School of Electrical and Electronic Engineering
Related Organization
Institute of Materials Research and Engineering, National University of Singapore
MBE Technology Pte Ltd, Singapore
MBE Technology Pte Ltd, Singapore
Version
Published version
Abstract
Postgrowth rapid thermal annealing was used to modify the structural and optical properties of the self-assembled InAs quantum dotsgrown on GaAs substrates by molecular beam epitaxy. It is found that significant narrowing of the luminescencelinewidth (from 78.9 to 20.5 meV) from the InAs dot layer occurs together with about 260 meV blueshift at annealing temperatures up to 850 °C. Observation of high-resolution transmission electron microscopy shows the existence of the dots under lower annealing temperatures but disappearance of the dotsannealed at 850 °C. The excited-state-filling experiments for the samples show that the luminescence of the samples annealed at 850 °C exhibits quantum well-like behavior. Comparing with the reference quantum well, we demonstrate significant enhancement of the interdiffusion in the dot layer.
Subject
Electrical and Electronic Engineering
Type
Journal Article
Series/Journal Title
Applied physics letters
Rights
© 1998 American Institute of Physics. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of American Institute of Physics. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.121595]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Collections
http://dx.doi.org/10.1063/1.121595
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