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      Design and characterization of low loss 50 picoseconds delay line on SOI platform

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      Author
      Xiao, Zhe
      Luo, Xianshu
      Liow, Tsung-Yang
      Lim, Peng Huei
      Prabhathan, Patinharekandy
      Zhang, Jing
      Luan, Feng
      Date of Issue
      2013
      School
      School of Electrical and Electronic Engineering
      Research Centre
      Research Techno Plaza
      Abstract
      We design and experimentally demonstrate 50 picoseconds (ps) low loss delay line on 300 nm SOI platform. The delay line unit consists of straight rib waveguide and strip bend section linked by a transition taper waveguide. Low propagation loss of ~0.1 dB/cm is achieved on the straight rib waveguide. With taking into account both low loss and desirable delay, a complete design and characterization process for passive delay line is presented. Our measurement results show that about 0.7 dB excess loss is achievable for 50 ps delay. The loss can be further reduced by adjusting the layout parameters.
      Subject
      DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
      Type
      Journal Article
      Series/Journal Title
      Optics express
      Rights
      © 2013 Optical Society of America.
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      • EEE Journal Articles
      http://dx.doi.org/10.1364/OE.21.021285
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