The effect of microscopic texture on the direct plasma surface passivation of Si solar cells.
Author
Mehrabian, S.
Xu, S.
Qaemi, A. A.
Shokri, B.
Chan, C. S.
Ostrikov, K.
Date of Issue
2013School
School of Electrical and Electronic Engineering
National Institute of Education
National Institute of Education
Version
Published version
Abstract
Textured silicon surfaces are widely used in manufacturing of solar cells due to increasing the light absorption probability and also the antireflection properties. However, these Si surfaces have a high density of surface defects that need to be passivated. In this study, the effect of the microscopic surface texture on the plasma surface passivation of solar cells is investigated. The movement of 105 H+ ions in the texture-modified plasma sheath is studied by Monte Carlo numerical simulation. The hydrogen ions are driven by the combined electric field of the plasma sheath and the textured surface. The ion dynamics is simulated, and the relative ion distribution over the textured substrate is presented. This distribution can be used to interpret the quality of the Si dangling bonds saturation and consequently, the direct plasma surface passivation.
Subject
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Type
Journal Article
Series/Journal Title
Physics of plasmas
Rights
© 2013 American Institue of Physics (AIP). This paper was published in Physics of Plasmas and is made available as an electronic reprint (preprint) with permission of AIP. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.4798527]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.
Collections
http://dx.doi.org/10.1063/1.4798527
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