dc.contributor.authorZhang, Betty Meng
dc.contributor.authorLai, Yicheng
dc.contributor.authorYuan, Wu
dc.contributor.authorSeah, Yen Peng
dc.contributor.authorShum, Perry Ping
dc.contributor.authorYu, Xia
dc.contributor.authorWei, Huifeng
dc.date.accessioned2014-02-24T13:04:56Z
dc.date.available2014-02-24T13:04:56Z
dc.date.copyright2014en_US
dc.date.issued2014
dc.identifier.citationZhang, B. M., Lai, Y., Yuan, W., Seah, Y. P., Shum, P. P., Yu, X., et al. (2014). Laser-assisted lateral optical fiber processing for selective infiltration. Optics Express, 22(3), 2675-2680.en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://hdl.handle.net/10220/18856
dc.description.abstractWe propose a new technique to perform precise selective infiltration of an air hole in the photonic crystal fiber (PCF). To carry out the infiltration process, the end face of the PCF is covered by a mask, which is fabricated by femtosecond laser inscription from the lateral direction. This proposed method overcomes the conventional limitation of maximum mask thickness. An analytical model is further proposed and demonstrated accurate determinations of the fabricated channel diameter in the mask.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesOptics Expressen_US
dc.rights© 2014 Optical Society of America. This paper was published in Optics Express and is made available as an electronic reprint (preprint) with permission of Optical Society of America. The paper can be found at the following official DOI: [http://dx.doi.org/10.1364/OE.22.002675].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en_US
dc.subjectDRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
dc.titleLaser-assisted lateral optical fiber processing for selective infiltrationen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Electrical and Electronic Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1364/OE.22.002675
dc.description.versionPublished versionen_US
dc.contributor.organizationA*STAR SIMTechen_US


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