Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/102410
Title: Low temperature photoresponse of monolayer tungsten disulphide
Authors: Cao, Bingchen
Shen, Xiaonan
Shang, Jingzhi
Cong, Chunxiao
Yang, Weihuang
Eginligil, Mustafa
Yu, Ting
Keywords: DRNTU::Engineering::Materials
Issue Date: 2014
Source: Cao, B., Shen, X., Shang, J., Cong, C., Yang, W., Eginligil, M., & Yu, T. (2014). Low temperature photoresponse of monolayer tungsten disulphide. APL materials, 2(11), 116101, 1-7.
Series/Report no.: APL materials
Abstract: High photoresponse can be achieved in monolayers of transition metal dichalcogenides. However, the response times are inconveniently limited by defects. Here, we report low temperature photoresponse of monolayer tungsten disulphide prepared by exfoliation and chemical vapour deposition (CVD) method. The exfoliated device exhibits n-type behaviour; while the CVD device exhibits intrinsic behaviour. In off state, the CVD device has four times larger ratio of photoresponse for laser on/off and photoresponse decay–rise times are 0.1 s (limited by our setup), while the exfoliated device has few seconds. These findings are discussed in terms of charge trapping and localization.
URI: https://hdl.handle.net/10356/102410
http://hdl.handle.net/10220/24276
ISSN: 2166-532X
DOI: http://dx.doi.org/10.1063/1.4900816
Rights: © 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

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