Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/85029
Title: Development of fixed abrasive chemical mechanical polishing process for glass disk substrates
Authors: Tian, Ye Bing
Zhong, Zhao Wei
Lai, S. T.
Ang, Y. J.
Keywords: Chemical mechanical polishing
Fixed abrasive polishing
Issue Date: 2013
Source: Tian, Y. B., Zhong, Z. W., Lai, S. T., & Ang, Y. J. (2013). Development of fixed abrasive chemical mechanical polishing process for glass disk substrates. The International Journal of Advanced Manufacturing Technology, 68(5), 993-1000.
Series/Report no.: The International Journal of Advanced Manufacturing Technology
Abstract: Glass disk substrates are used in a wide range of portable devices because of their relatively high resistance to heat and shocks compared to aluminum substrates. Chemical mechanical polishing (CMP) with fixed abrasive pad is an alternative glass disk substrates finishing method to loose abrasive lapping and polishing with traditional pad. In this paper, we developed a chemical mechanical polishing process for 2.5-inch glass disk substrates using a fixed abrasive pad. A serial of CMP experiments were carried out under different polishing variables and conditioning modes (ex situ and in situ conditioning). The polishing performances were evaluated and analyzed in terms of surface roughness, surface topography, and material removal rate. The polishing characteristics were also discussed to reveal material removal mechanism and surface generation involved in fixed abrasive CMP for glass disk substrates.
URI: https://hdl.handle.net/10356/85029
http://hdl.handle.net/10220/40941
ISSN: 0268-3768
DOI: 10.1007/s00170-013-4890-4
Rights: © 2013 Springer-Verlag London.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MAE Journal Articles
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