Resolution criteria in double-slit microscopic imaging experiments
Date of Issue2016
School of Physical and Mathematical Sciences
Double-slit imaging is widely used for verifying the resolution of high-resolution and super-resolution microscopies. However, due to the fabrication limits, the slit width is generally non-negligible, which can affect the claimed resolution. In this paper we theoretically calculate the electromagnetic field distribution inside and near the metallic double slit using waveguide mode expansion method, and acquire the far-field image by vectorial Fourier optics. We find that the slit width has minimal influence when the illuminating light is polarized parallel to the slits. In this case, the claimed resolution should be based on the center-to-center distance of the double-slit.
Imaging and Sensing
© 2016 The Author(s). This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/