Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/87269
Title: Tailoring the structural and magnetic properties of masked CoPt thin films using ion implantation
Authors: Kumar, Durgesh
Gupta, Surbhi
Jin, Tianli
Nongjai, R.
Asokan, K.
Piramanayagam, S. N.
Keywords: Ion
Condensed Matter Properties
Issue Date: 2018
Source: Kumar, D., Gupta, S., Jin, T., Nongjai, R., Asokan, K., & Piramanayagam, S. N. (2018). Tailoring the structural and magnetic properties of masked CoPt thin films using ion implantation. AIP Advances, 8(5), 056504-.
Series/Report no.: AIP Advances
Abstract: The effects of ion implantations through a mask on the structural and magnetic properties of Co80Pt20 films were investigated. The mask was patterned using the self-assembly of diblock copolymers. For implantation, high (40 keV for 14N+ and 100 keV for 40Ar+) and low (7.5 keV for 14N+ and 4.5 keV for 40Ar+) energy 14N+ and 40Ar+ ions were used to modify the structural and magnetic properties of these films. X-ray diffraction and TRIM simulations were performed for understanding the structural changes due to ion implantations. These results revealed the intermixing of Co atoms in lower layers and lattice expansion in Co80Pt20 magnetic and Ru layers. A lateral straggling of Co caused an increase in the exchange coupling in the masked region. Depletion of Co atoms in Co80Pt20 layer caused a decrease in the anisotropy constant, which were further confirmed by the alternating gradient force magnetometer and magnetic force microscopy results. The magnetic force microscopy images showed an increase in domain width and domain wall width confirming the above-mentioned effects.
URI: https://hdl.handle.net/10356/87269
http://hdl.handle.net/10220/44368
ISSN: 2158-3226
DOI: http://dx.doi.org/10.1063/1.5007767
Rights: © 2018 The Author(s) (published by American Institute of Physics). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:SPMS Journal Articles

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