Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/89553
Title: Controlled synthesis of atomically layered hexagonal boron nitride via chemical vapor deposition
Authors: Liu, Juanjuan
Liu, Zheng
Kutty, Rajendrannair Govindan
Keywords: Chemical Vapor Deposition
Hexagonal Boron Nitride
DRNTU::Engineering::Materials
Issue Date: 2016
Source: Liu, J., Kutty, R. G., & Liu, Z. (2016). Controlled synthesis of atomically layered hexagonal boron nitride via chemical vapor deposition. Molecules, 21(12), 1636-. doi:10.3390/molecules21121636
Series/Report no.: Molecules
Abstract: Hexagonal boron nitrite (h-BN) is an attractive material for many applications including electronics as a complement to graphene, anti-oxidation coatings, light emitters, etc. However, the synthesis of high-quality h-BN is still a great challenge. In this work, via controlled chemical vapor deposition, we demonstrate the synthesis of h-BN films with a controlled thickness down to atomic layers. The quality of as-grown h-BN is confirmed by complementary characterizations including high-resolution transition electron microscopy, atomic force microscopy, Raman spectroscopy and X-ray photo-electron spectroscopy. This work will pave the way for production of large-scale and high-quality h-BN and its applications as well.
URI: https://hdl.handle.net/10356/89553
http://hdl.handle.net/10220/46274
ISSN: 1420-3049
DOI: http://dx.doi.org/10.3390/molecules21121636
Rights: © 2016 by the authors; licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC-BY) license (http://creativecommons.org/licenses/by/4.0/).
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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