Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/87460
Title: Oxidation-based continuous laser writing in vertical nano-crystalline graphite thin films
Authors: Loisel, Loïc
Florea, Ileana
Cojocaru, Costel-Sorin
Tay, Beng Kang
Lebental, Bérengère
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Carbon Films
Laser
Issue Date: 2016
Source: Loisel, L., Florea, I., Cojocaru, C.-S., Tay, B. K., & Lebental, B. (2016). Oxidation-based continuous laser writing in vertical nano-crystalline graphite thin films. Scientific Reports, 6, 26224-. doi:10.1038/srep26224
Series/Report no.: Scientific Reports
Abstract: Nano and femtosecond laser writing are becoming very popular techniques for patterning carbon-based materials, as they are single-step processes enabling the drawing of complex shapes without photoresist. However, pulsed laser writing requires costly laser sources and is known to cause damages to the surrounding material. By comparison, continuous-wave lasers are cheap, stable and provide energy at a more moderate rate. Here, we show that a continuous-wave laser may be used to pattern vertical nano-crystalline graphite thin films with very few macroscale defects. Moreover, a spatially resolved study of the impact of the annealing to the crystalline structure and to the oxygen ingress in the film is provided: amorphization, matter removal and high oxygen content at the center of the beam; sp2 clustering and low oxygen content at its periphery. These data strongly suggest that amorphization and matter removal are controlled by carbon oxidation. The simultaneous occurrence of oxidation and amorphization results in a unique evolution of the Raman spectra as a function of annealing time, with a decrease of the I(D)/I(G) values but an upshift of the G peak frequency.
URI: https://hdl.handle.net/10356/87460
http://hdl.handle.net/10220/46721
DOI: 10.1038/srep26224
Rights: © 2016 The Authors (Nature Publishing Group). This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:EEE Journal Articles

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