dc.contributor.authorWang, Q.
dc.contributor.authorYuan, Guanghui
dc.contributor.authorKiang, K. S.
dc.contributor.authorSun, K.
dc.contributor.authorGholipour, B.
dc.contributor.authorRogers, E. T. F.
dc.contributor.authorHuang, K.
dc.contributor.authorAng, S. S.
dc.contributor.authorZheludev, Nikolay I.
dc.contributor.authorTeng, J. H.
dc.date.accessioned2019-01-16T04:57:31Z
dc.date.available2019-01-16T04:57:31Z
dc.date.issued2017
dc.identifier.citationWang, Q., Yuan, G., Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., ... Teng, J. H. (2017). Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110(20), 201110-. doi:10.1063/1.4983198en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://hdl.handle.net/10220/47486
dc.description.abstractWe demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique.en_US
dc.description.sponsorshipASTAR (Agency for Sci., Tech. and Research, S’pore)en_US
dc.description.sponsorshipMOE (Min. of Education, S’pore)en_US
dc.format.extent5 p.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesApplied Physics Lettersen_US
dc.rights© 2017 American Institute of Physics. All rights reserved. This paper was published in Applied Physics Letters and is made available with permission of American Institute of Physics.en_US
dc.subjectFemtosecond Lasersen_US
dc.subjectSemiconductorsen_US
dc.subjectDRNTU::Science::Physicsen_US
dc.titleReconfigurable phase-change photomask for grayscale photolithographyen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Physical and Mathematical Sciencesen_US
dc.identifier.doihttp://dx.doi.org/10.1063/1.4983198
dc.description.versionPublished versionen_US
dc.contributor.organizationThe Photonics Instituteen_US
dc.contributor.organizationCentre for Disruptive Photonic Technologiesen_US


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