Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/90264
Title: On-wafer microstrip meander-line slow-wave structure at Ka-band
Authors: Xia, Xin
Ali, Zishan
Miao, Jianmin
Wang, Shaomeng
Aditya, Sheel
Keywords: DRNTU::Engineering::Electrical and electronic engineering
Meander Line
Microfabrication
Issue Date: 2018
Source: Wang, S., Aditya, S., Xia, X., Ali, Z., & Miao, J. (2018). On-Wafer Microstrip Meander-Line Slow-Wave Structure at Ka-Band. IEEE Transactions on Electron Devices, 65(6), 2142-2148. doi:10.1109/TED.2018.2798575
Series/Report no.: IEEE Transactions on Electron Devices
Abstract: A novel configuration for a Ka-band V-shaped microstrip meander-line slow-wave structure (SWS) is reported. The SWS is designed to work at a voltage less than 4 kV and provide a wide bandwidth. Coplanar waveguide (CPW) input-output feed lines and a shielding structure are incorporated to enable fast on-wafer cold test measurements on a CPW probe station without requiring dicing or a metal enclosure. Simulated dispersion characteristics and coupling impedance for the optimized design are presented. The simulated S11 of the entire structure is better than -15 dB over 25-36 GHz. The proposed configuration is fabricated using 4'' Si wafers and standard microfabrication processes. The measured S11 of the entire structure is better than -10 dB over 20-40 GHz. The observed high insertion loss has been explained in detail, and alternative approaches that can reduce the loss have been proposed. The PIC simulation results show that for a 3.6-kV, 50-mA sheet beam, the output power can potentially reach 14.5 W at 34 GHz with a gain of 21.6 dB. A 3-dB bandwidth of about 25% centered at 32 GHz is also indicated.
URI: https://hdl.handle.net/10356/90264
http://hdl.handle.net/10220/48450
ISSN: 0018-9383
DOI: http://dx.doi.org/10.1109/TED.2018.2798575
Rights: © 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: https://doi.org/10.1109/TED.2018.2798575.
metadata.item.grantfulltext: open
metadata.item.fulltext: With Fulltext
Appears in Collections:EEE Journal Articles

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