dc.contributor.authorSingh, Vijay Raj
dc.contributor.authorHegde, Gopalkrishna M.
dc.contributor.authorAsundi, Anand Krishna
dc.identifier.citationSingh, V. R., Hegde, G., & Asundi, A. K. (2006). Digital in-line holography for dynamic micro-metrology. Paper presented at the Optical Micro- and Nanometrology in Microsystems Technology.en_US
dc.description.abstractIn this paper in-line digital holography has been explored for dynamic micro metrological applications. In in-line digital holography, full CCD sensor area is utilized for real image reconstruction of the objects with less speckle noise. Numerical evaluation of the amplitude and phase information during reconstruction process finds promising applications in optical micro-metrology. Vibration analysis of the smaller object has been performed by combining the time average principle with in-line digital holographic methods. A double exposure method has been explored for measurements, which is simultaneously used to suppress the overlapping of zero-order and twin image wave with real image wave. The vibration amplitude and mean static state deformation of the harmonically excited object are analysed separately from time average in-line digital holograms. The experimental results are presented for a thin aluminium membrane of 5mm diameter.en_US
dc.format.extent9 p.en_US
dc.rights© 2006 SPIE. This paper was published in Proc. SPIE 6188 and is made available as an electronic reprint (preprint) with permission of SPIE. The paper can be found at: [DOI: http://dx.doi.org/10.1117/12.664812].  One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law.en_US
dc.subjectDRNTU::Science::Physics::Optics and light
dc.titleDigital in-line holography for dynamic micro-metrologyen_US
dc.typeConference Paper
dc.contributor.conferenceOptical Micro- and Nanometrology in Microsystems Technology (1st : 2006 : Strasbourg, France)en_US
dc.contributor.schoolSchool of Mechanical and Aerospace Engineeringen_US
dc.description.versionPublished versionen_US

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