Please use this identifier to cite or link to this item:
https://hdl.handle.net/10356/91348
Title: | Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements | Authors: | Karuturi, Siva Krishna Liu, Lijun Su, Liap Tat Zhao, Yang Fan, Hong Jin Ge, Xiaochen He, Sailing Tok, Alfred Iing Yoong |
Keywords: | DRNTU::Engineering::Materials::Photonics and optoelectronics materials | Issue Date: | 2010 | Source: | Karuturi, S., Liu, L., Su, L. T., Zhao, Y., Fan, H. J., Ge, X., & et al. (2010). Kinetics of Stop Flow Atomic Layer Deposition for High Aspect Ratio Template Filling through Photonic Bandgap Measurements, Journal of Physical Chemistry C, 114(35), 14843-14848. | Series/Report no.: | Journal of physical chemistry C | Abstract: | Atomic layer deposition (ALD) is shown as a unique method to produce high aspect ratio (AR) nanostructures through conformal filling and replication of high AR templates. The stop-flow process is often used as an alternative to the conventional continuous flow process to obtain high step coverage. However, there is a need for understanding the deposition kinetics and optimizing the deposition process to fabricate defect-free nanostructures. In this Article, TiO2 ALD in high AR self-assembled opal photonic crystal templates was performed in stop-flow fill−hold−purge process in comparison with continuous flow pulse−purge process. Photonic band gap properties of opal templates were characterized and compared with simulated band diagrams for quantitative investigation of filling kinetics and the effect of shrinking pore size on filling uniformity. Γ−L bands in the transmittance spectra of ALD-infiltrated opals accurately represented the depth profile of the depositions without the need for expensive sample preparation techniques and characterization tools. It was found that the stop-flow process attains higher Knudsen flow rates of precursor gases, thereby achieving homogeneous and complete filling at considerably lower cycle time. | URI: | https://hdl.handle.net/10356/91348 http://hdl.handle.net/10220/7416 |
DOI: | 10.1021/jp1053748 | Schools: | School of Materials Science & Engineering | Rights: | © 2010 American Chemical Society | Fulltext Permission: | none | Fulltext Availability: | No Fulltext |
Appears in Collections: | MSE Journal Articles |
SCOPUSTM
Citations
10
40
Updated on Mar 10, 2024
Web of ScienceTM
Citations
10
41
Updated on Oct 27, 2023
Page view(s) 5
1,194
Updated on Mar 18, 2024
Google ScholarTM
Check
Altmetric
Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.