Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/91348
Title: Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements
Authors: Karuturi, Siva Krishna
Liu, Lijun
Su, Liap Tat
Zhao, Yang
Fan, Hong Jin
Ge, Xiaochen
He, Sailing
Tok, Alfred Iing Yoong
Keywords: DRNTU::Engineering::Materials::Photonics and optoelectronics materials
Issue Date: 2010
Source: Karuturi, S., Liu, L., Su, L. T., Zhao, Y., Fan, H. J., Ge, X., & et al. (2010). Kinetics of Stop Flow Atomic Layer Deposition for High Aspect Ratio Template Filling through Photonic Bandgap Measurements, Journal of Physical Chemistry C, 114(35), 14843-14848.
Series/Report no.: Journal of physical chemistry C
Abstract: Atomic layer deposition (ALD) is shown as a unique method to produce high aspect ratio (AR) nanostructures through conformal filling and replication of high AR templates. The stop-flow process is often used as an alternative to the conventional continuous flow process to obtain high step coverage. However, there is a need for understanding the deposition kinetics and optimizing the deposition process to fabricate defect-free nanostructures. In this Article, TiO2 ALD in high AR self-assembled opal photonic crystal templates was performed in stop-flow fill−hold−purge process in comparison with continuous flow pulse−purge process. Photonic band gap properties of opal templates were characterized and compared with simulated band diagrams for quantitative investigation of filling kinetics and the effect of shrinking pore size on filling uniformity. Γ−L bands in the transmittance spectra of ALD-infiltrated opals accurately represented the depth profile of the depositions without the need for expensive sample preparation techniques and characterization tools. It was found that the stop-flow process attains higher Knudsen flow rates of precursor gases, thereby achieving homogeneous and complete filling at considerably lower cycle time.
URI: https://hdl.handle.net/10356/91348
http://hdl.handle.net/10220/7416
DOI: http://dx.doi.org/10.1021/jp1053748
Rights: © 2010 American Chemical Society
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

Google ScholarTM

Check

Altmetric

Items in DR-NTU are protected by copyright, with all rights reserved, unless otherwise indicated.