Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/93781
Title: Enhanced thermopower of graphene films with oxygen plasma treatment
Authors: Ajayan, Pulickel M.
Xiao, Ni
Dong, Xiaochen
Song, Li
Liu, Dayong
Tay, Yee Yan
Wu, Shixin
Li, Lain-Jong
Zhao, Yang
Yu, Ting
Zhang, Hua
Huang, Wei
Hng, Huey Hoon
Yan, Qingyu
Keywords: DRNTU::Engineering::Materials::Nanostructured materials
DRNTU::Engineering::Materials::Plasma treatment
Issue Date: 2011
Source: Xiao, N., Dong, X., Song, L., Liu, D., Tay, Y. Y., Wu, S. et al. (2011). Enhanced Thermopower of Graphene Films with Oxygen Plasma Treatment. ACS Nano, 5 (4), 2749–2755.
Series/Report no.: ACS nano
Abstract: In this work, we show that the maximum thermopower of few layers graphene (FLG) films could be greatly enhanced up to ∼700 μV/K after oxygen plasma treatment. The electrical conductivities of these plasma treated FLG films remain high, for example, ∼104 S/m, which results in power factors as high as ∼4.5 x 10-3 W K-2 m-1. In comparison, the pristine FLG films show a maximum thermopower of ∼80 μV/K with an electrical conductivity of ∼5 x 104 S/m. The proposed mechanism is due to generation of local disordered carbon that opens the band gap. Measured thermopowers of single-layer graphene (SLG) films and reduced graphene oxide (rGO) films were in the range of -40 to 50 and -10 to 20 μV/K, respectively. However, such oxygen plasma treatment is not suitable for SLG and rGO films. The SLG films were easily destroyed during the treatment while the electrical conductivity of rGO films is too low, which makes FLG films unique for possible TE applications.
URI: https://hdl.handle.net/10356/93781
http://hdl.handle.net/10220/7452
DOI: 10.1021/nn2001849
Schools: School of Materials Science & Engineering 
Rights: © 2011 American Chemical Society. This is the author created version of a work that has been peer reviewed and accepted for publication by ACS Nano, American Chemical Society.  It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document.  The published version is available at: [DOI: http://dx.doi.org/10.1021/nn2001849 ]
Fulltext Permission: open
Fulltext Availability: With Fulltext
Appears in Collections:MSE Journal Articles

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