dc.contributor.authorSun, T.
dc.contributor.authorMa, Jan
dc.contributor.authorYan, Qingyu
dc.contributor.authorHuang, Y. Z.
dc.contributor.authorWang, J. L.
dc.contributor.authorHng, Huey Hoon
dc.date.accessioned2012-02-09T06:11:45Z
dc.date.available2012-02-09T06:11:45Z
dc.date.copyright2009en_US
dc.date.issued2009
dc.identifier.citationSun, T., Ma, J., Yan, Q., Huang, Y. Z., Wang, J. L. & Hng, H. H. (2009). Influence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin films. Journal of Crystal Growth, 311(16), 4123–4128.en_US
dc.identifier.urihttp://hdl.handle.net/10220/7518
dc.description.abstractThe effects of deposition rate on the microstructure and thermoelectric (TE) properties of Ca3Co4O9 thin films fabricated by pulsed laser deposition (PLD) technique were investigated. X-ray diffraction (XRD) and high-resolution transmission electron microscopy (HR-TEM) revealed that a fast deposition rate resulted in not only low crystallinity but also the existence of the CaxCoO2 secondary phase. Formation of CaxCoO2 was inevitable during the thin film growth, and this was discussed from both structural and compositional point of view. With longer deposition interval or with sufficient oxygen at a lower deposition rate, the CaxCoO2 phase was able to transit into the desired Ca3Co4O9 phase during the coalescence process. The quality of the thin films was further analyzed by electrical properties measurements. The Ca3Co4O9 thin film fabricated at a slower deposition rate was found to exhibit a low electrical resistivity of 9.4 mΩ cm and high Seebeck coefficient of 240 μV/K at about 700 °C, indicating a good quality film.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesJournal of crystal growthen_US
dc.rights© 2009 Elsevier B.V. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Crystal Growth, Elsevier B.V.. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.jcrysgro.2009.06.044 .en_US
dc.subjectDRNTU::Engineering::Materials
dc.titleInfluence of pulsed laser deposition rate on the microstructure and thermoelectric properties of Ca3Co4O9 thin filmsen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Materials Science and Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1016/j.jcrysgro.2009.06.044
dc.description.versionAccepted versionen_US


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