An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering
Yi, J. B.
Zhou, Y. Z.
Chow, Gan Moog
White, Timothy John
Gao, Xing Yu
Wee, A. T. S.
Yu, X. J.
Date of Issue2004
School of Materials Science and Engineering
Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500 °C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure.
Journal of magnetism and magnetic materials
© 2004 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Magnetism and Magnetic Materials, Elsevier. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.jmmm.2004.06.052.