dc.contributor.authorRosner, Bjoern
dc.contributor.authorAmro, Nabil A.
dc.contributor.authorDisawal, Sandeep
dc.contributor.authorDemers, Linette M.
dc.contributor.authorZhang, Hua
dc.contributor.authorRendlen, Jeff
dc.contributor.authorDuenas, Tenisa
dc.contributor.authorShile, Roger
dc.contributor.authorFragala, Joe
dc.contributor.authorElghanian, Robert
dc.identifier.citationRosner, B., Amro, N., Disawal, S., Demers, L. M., Zhang, Hua, Rendlen, J., et al. (2004). Dip Pen Nanolithography and Its Potential for Nanoelectronics. In 2004 4th IEEE Conference on Nanotechnology, pp.59-61.en_US
dc.description.abstractDip pen nanolithography (DPN) is a patterning technique for nanoscale science and engineering based on scanning probe microscopy. Its main advantages are very high resolution, the unique capability to deposit many different materials directly onto a substrate and low cost of ownership. We present here new research and development efforts that demonstrate the potential of DPN as a tool to produce nanoelectronic devices and circuits. We show the direct deposition of electronic materials as well as the use of external accessories to accelerate the development phase of nanoelectronic components.en_US
dc.rights© 2004 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: [DOI: http://dx.doi.org/ 10.1109/NANO.2004.1392249].en_US
dc.titleDip pen nanolithography and its potential for nanoelectronicsen_US
dc.typeConference Paper
dc.contributor.conferenceConference on Nanotechnology (4th : 2004 : Munich, Germany)en_US
dc.contributor.schoolSchool of Materials Science and Engineeringen_US
dc.identifier.doihttp://dx.doi.org/ 10.1109/NANO.2004.1392249
dc.description.versionAccepted versionen_US

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