dc.contributor.authorKasim, J.
dc.contributor.authorTee, X. Y.
dc.contributor.authorYou, Y. M.
dc.contributor.authorNi, Zhenhua
dc.contributor.authorSetiawan, Y.
dc.contributor.authorLee, Pooi See
dc.contributor.authorChan, L.
dc.contributor.authorShen, Zexiang
dc.date.accessioned2012-09-13T03:32:45Z
dc.date.available2012-09-13T03:32:45Z
dc.date.copyright2008en_US
dc.date.issued2008
dc.identifier.citationKasim, J., Tee, X. Y., You, Y. M., Ni, Z. H., Setiawan, Y., Lee, P. S., et al. (2008). Plasmon-enhanced polarized Raman spectroscopy for sensitive surface characterization. Journal of raman spectroscopy, 39(10), 1338-1342.en_US
dc.identifier.urihttp://hdl.handle.net/10220/8513
dc.description.abstractLocal-mode and localized surface plasmons generated on the silver thin film can selectively enhance the Raman signal from the surface. Further improvement of surface signal can be obtained by using the polarized Raman technique that results in a dramatic enhancement of the surface sensitivity by up to 25.4 times as compared to that without a silver coating. This technique will be very useful for Raman study on samples that suffer overlapping background signal. In this article, we show that it can be used to significantly improve the signal of thin strained-Si layer on top of SiGe buffer layer.en_US
dc.language.isoenen_US
dc.relation.ispartofseriesJournal of Raman spectroscopyen_US
dc.rights© 2008 John Wiley & Sons, Ltd.en_US
dc.subjectDRNTU::Engineering::Materials
dc.titlePlasmon-enhanced polarized Raman spectroscopy for sensitive surface characterizationen_US
dc.typeJournal Article
dc.contributor.schoolSchool of Materials Science and Engineeringen_US
dc.identifier.doihttp://dx.doi.org/10.1002/jrs.1999


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