Please use this identifier to cite or link to this item: https://hdl.handle.net/10356/95377
Title: Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography
Authors: Mirkin, Chad A.
Zhang, Hua
Chung, Sung-Wook
Keywords: DRNTU::Engineering::Materials
Issue Date: 2003
Source: Zhang, H., Chung, S. W., & Mirkin, C. A. (2003). Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography. Nano Letters, 3(1), 43-45.
Series/Report no.: Nano letters
Abstract: The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold.
URI: https://hdl.handle.net/10356/95377
http://hdl.handle.net/10220/8574
ISSN: 1530-6984
DOI: http://dx.doi.org/10.1021/nl0258473
Rights: © 2003 American Chemical Society.
Fulltext Permission: none
Fulltext Availability: No Fulltext
Appears in Collections:MSE Journal Articles

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